Chemical vapor deposition (CVD) is a versatile process for the manufacturing of coatings. Basically, this process is a chemical reaction between a substrate material and vapor phase precursors. NKCG coatings are based on Thermal CVD, where the deposition process is promoted by heat.

CVD enables a deposition of homogeneous layers from nanometers up to micrometers on the surface over a broad range of substrates (shape or material).

However, in some applications, such as the reinforcement of CFC or insulation grades, it is required to deposit the coating inside the pores of the material without closing them.

For these applications, NKCG offers chemical vapor infiltration (CVI), a type of CVD in which the reactive gas infiltrates the porous material to be covered.

CVI allows the deposition in the depth, which densifies the structure of the material. In Windhagen, NKCG has several lines dedicated to the deposition of coatings using CVD or CVI processes, and can apply these processes to meet specific requirements.

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