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Graphite for the semiconductor industry
With comprehensive expertise in materials and processes, we cover all types of semiconductor applications. Nippon Kornmeyer has been a reliable partner for semiconductor material and system manufacturers for decades, leveraging this extensive experience to optimize processes.
PECVD graphite substrates in photovoltaics
Nippon Kornmeyer has been a leader in the development and application of since 1990 Plasma-assisted chemical vapor deposition (PECVD) for the deposition of silicon nitride for the antireflection coating of substrates.
Technology & Processes
- Qualified personnel operating one of the most modern and versatile machine halls in the industry.
- Nitrogen-free thermal/chemical cleaning
- Surface finishing, e.g. CVD / CVI with PyC / TaC / SiC
- SiC conversion
- Downstream cleaning processes such as ultrasonic cleaning, wet etching, plasma etching
- Cleanroom and packaging facilities compliant with semiconductor requirements
Quality
- End-to-end traceability, from raw material to finished product
- 3D-CCM multi-sensor technology for conformity testing
- Continuously accessible quality records SPC & CPK
- Absolute security of customer data
Research & Development
- In-house R&D and laboratory services; independent quality control by accredited third-party laboratories upon request.
- Continuous product and process development in collaboration with universities and research laboratories
Graphite and CFC in the Czochralski process
We produce their Plant componentsTailored to your requirements, we support you with decades of experience in plant and process optimization. Our product range includes, in addition to... Support crucibles, heating elements and reflectors in the upper cathedral area including the entire range of Insulation components out of Soft and hard felt. Our Support crucibles are optionally also made of CFC materials Available. All components can optionally be purchased with further finishing steps such as thermal-chemical cleaning and a wide range of coatings.
More about our coatings
Siemens and
FBR processes
We manufacture your plant components, tailored to your specific requirements, and support you with decades of experience in plant and process optimization. Our product range includes complete graphite structures and insulation for STC-TCS converters , as well as graphite electrodes for polysilicon deposition reactors.
We also supply large-format structural components for use in fluidized bed reactors for the production of granulated polysilicon. All components can be optionally purchased with further refinement steps such as thermal-chemical cleaning and a wide range of coatings. The SICCOTA® coating has proven particularly effective in sensitive plant environments.
Physical Vapor Transport [PVT]
We manufacture your plant components, tailored to your specific requirements, and support you with decades of experience in plant and process optimization. Our product range includes the complete graphite hot zone assembly, consisting of an outer crucible container and the internal crystal growth zone assembly, as well as insulation made of soft and hard felt materials for the operation of inductively and resistance-heated systems.
All components can be optionally purchased with further finishing steps such as thermochemical cleaning and a wide range of coatings. The TACCOTA® coating has proven particularly effective for use in the PVT process and, thanks to our patented coating method, can also be applied selectively.
Wafer processing
We manufacture your plant components, tailored to your specific requirements, and support you with decades of experience in plant and process optimization.
In addition to essential thermochemical cleaning, we offer a wide range of coatings.
Learn more about our coatings
In addition to essential thermochemical cleaning, we offer a wide range of coatings.
Learn more about our coatings
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