It is the key to durable, efficient, and economical solutions. At Nippon Kornmeyer, we develop and refine processes that make a difference: from patented coatings to precise infiltration and modification processes.
Our goal: to optimize material properties so that your components last longer, perform better, and your processes run more reliably. To achieve this, we draw not only on decades of experience in high-temperature processes and materials development, but also actively collaborate with leading research institutes—such as the Fraunhofer Institute —and participate in national and international research projects.
This close R&D collaboration enables us to adapt technologies to new market demands at an early stage and bring innovations into industrial practice more quickly.
Oxidation and corrosion protection for graphite.
CVD-deposited silicon carbide for maximum purity and chemical resistance. Ideal for wafer substrates and semiconductor manufacturing.
Learn more about CVD coating.
CVD/CVI PyC coatings and infiltrations for graphite and CFCs. Optimize porosity, gas tightness, and oxidation resistance – high-purity versions available.
Learn more about PyC
Monolithic silicon carbide from graphite.