It's the key to long-lasting, efficient, and cost-effective solutions. At Nippon Kornmeyer, we develop and refine processes that make a difference: from patented coatings to precise infiltration and modification processes.
Our goal: to optimize material properties so that your components last longer, perform better, and processes run more reliably. To achieve this, we not only draw on decades of experience in high-temperature processes and materials development, but also actively collaborate with leading research institutes—such as the Fraunhofer Institute —and in national and international research projects .
This close R&D collaboration enables us to adapt technologies to new market requirements at an early stage and bring innovations into industrial practice more quickly.
Oxidation and corrosion protection for graphite.
CVD-deposited silicon carbide for maximum purity and chemical resistance. Ideal for wafer carriers and semiconductor manufacturing.
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CVD/CVI PyC coatings and infiltrations for graphite and CFC. Optimize porosity, gas tightness, and oxidation resistance – high-purity versions available.
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Monolithic silicon carbide from graphite.